Ultrapure Water

Graver Technologies provides effective technology to meet the requirements for ultrapure water.

Graver Technologies Ultrapure Water

High Performance Filtration Technology For Ultrapure/DI Water

The specifications for Ultrapure water quality have become increasingly stringent over the years and the filter technology has evolved to meet these requirements. Semiconductor facilities can utilize ultrapure water at a rate of 2 MGD or ~5500 m3/day. The specifications for ultrapure water for the semiconductor industry are the most stringent. These water factories are usually stand-alone facilities operated almost independently from the Fab. Water must meet both particle and conductivity specifications, requiring the use of reverse osmosis, resin beds as well as mechanical filtration technologies. Final filters rated below 0.1 microns are typical before sending water to the Fab, where the point of use filters of similar ratings may be found.

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Graver Technologies Ultrapure Water

About Graver's Filters For Ultrapure Water

  • Manufactured, flushed with 18 MΩ-cm DI water, tested, and packaged in an ISO Class 7 Cleanroom Environment to ensure low extractable and low particle shedding
  • Particulate removal from incoming water streams
  • Clarify/trap ion exchange resin from upstream processes
  • Reverse osmosis (RO) filter prefiltration
  • Superior flow characteristics, high contaminant capacity, and consistent removal of submicron particles.
  • Cartridges exhibit rapid rinse-up to 18 MΩ-cm resistivity and single-digit ppb levels of TOC.

Product Selection

  • ZTEC™ E for critical particle control down to 0.03 micron
  • Stratum® A, PMA™, Stratum ™ C 0.5 and 1 micron melt blown filters provide effective protection of the RO membrane
  • WaterTEC™ 0.05 to 0.2 micron membrane as an economical membrane option in non-critical applications

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