Ultrapure Chemicals

Graver Technologies provides high performance filtration technology to meet the requirements for ultrapure chemicals.

Ultrapure Chemicals

High Performance Filter Technology for Ultrapure Chemicals

The manufacture of very small electronic components, referred to as semiconductors, includes devices such as transistors, capacitors, resistors, diodes, LED and photocells. The different types of devices can be integrated together to form integrated circuits, or VLSI (Very Large Scale Integration) devices such as microprocessors and random access memory (RAM). The high purity processes require the use of equally high purity chemicals stripping, etching, buffering and rinsing. These processes utilize solvent-based or aqueos based chemicals and chemical mixtures, all of which must filter to nanometer levels to ensure minimal defects and result in high yield. Many of these processes may require temperature in excess of 150C which will limit the processes to materials composed only of fluoropolymers such as PFA and PTFE.

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Ultrapure Chemicals

About Graver's Filters For Ultrapure Chemicals

  • Fluoropolymer membrane and all-fluoropolymer construction to meet the chemical compatibility requirements for solvent-based strippers, Piranha and aggressive acid-based products.
  • Manufactured, flushed with 18 MΩ-cm DI water, tested and packaged in an ISO Class 7 Cleanroom Environment to ensure low extractables and low particle shedding
  • PES membrane for aqueous based acids, offering superior flow characteristics, high contaminant capacity and consistent removal of submicron particles.

Product Selection

  • ZTEC™ E - For critical particle control down to 0.03 micron for aqueous chemicals
  • TefTEC™ - Hydrophobic PTFE membrane for more aggressive chemical applications
  • Citadel® - All-fluoropolymer filter for the most critical and aggressive chemical applications
  • QMA – High-efficiency, hydrophilic membrane for reliable particle control in ultrapure chemical applications.

Final Applications

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