Chemical Vapor Deposition
Graver Technologies provides high performance filtration for vacuum pump applications.
Highly Effective Removal of Particle From High Temperature Gas Vacuum Lines
Metal Organic Chemical Vapor Deposition is an enhanced variant of chemical vapor deposition used for creating high purity crystalline semiconducting thin films and micro/nano structures and is the industry leading technology used in LEDs, solar cells, and field effect transistors (FETs). However, the MOCVD processes (SiC, GaAs, GaN, other compound semiconductor) also produces powders and particulates when the exhaust gas flow to the low temperature (about 150 ℃) pipe and vacuum pump. The particulates can cause unexpected and significant damage to vacuum pumps. To protect the vacuum pumps, high performance filter is needed to catch small particles at high working temperature.
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Optional Added ContentLorem ipsum dolor sit amet, consectetur adipiscing elit. Suspendisse varius enim in eros elementum tristique. Duis cursus, mi quis viverra ornare, eros dolor interdum nulla, ut commodo diam libero vitae erat. Aenean faucibus nibh et justo cursus id rutrum lorem imperdiet. Nunc ut sem vitae risus tristique posuere.About Graver's Filters For Chemical Vapor Deposition
- Replaceable, cleanable element that features a pleated or "radial fin" cartridge design offers maximum filter area in a compact filter assembly
- Provides positive gasket sealing to prevent by-pass of unfiltered fluids. Long filter life, low pressure drop, large dirt holding capacity, and efficient filtration are assured.
- Most models employ only one filter element to permit quick and simple cartridge changeout.
- All models can be quickly serviced without breaking pipe connections and the inlet/outlet connections are furnished in a horizontal in-line configuration
Product Selection
- Consler® LKV/HKV Series Vacuum Filters - to protect vacuum pumps at high working temperatures
Final Applications
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